Pulse Implantation of Ions in Laser Ablation of Materials

Feasibilities of a new technique are studied for the high energy ions implantation from pulse plasma, produced by laser nanosecond pulses near the processed surface. To accelerate ions, high voltage pulses are applied to the processed substrate when the erosion flare from the laser-irradiated target approaches it. The dependence of the implanted ions energy spectrum on plasma characteristics and also on modes of applying the laser and high voltage pulses is determined.